Please use this identifier to cite or link to this item: http://dspace.uniten.edu.my/jspui/handle/123456789/12984
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dc.contributor.authorSobayel, K.en_US
dc.contributor.authorNurhafiza, K.en_US
dc.contributor.authorAkhtaruzzaman, M.en_US
dc.contributor.authorAyob, A.en_US
dc.contributor.authorAmin, N.en_US
dc.date.accessioned2020-02-03T03:28:17Z-
dc.date.available2020-02-03T03:28:17Z-
dc.date.issued2019-
dc.description.abstractPhysical Vapor Deposition (PVD) was used to grow ultra-thin tungsten di sulfide (WS2) layers on top of soda lime glass substrates. Deposition power of radio frequency magnetron sputtering was varied (50W, 100 W, 150 W,200 W and 250 W) to study its impact on film characteristics for suitable application in solar cell. Structural, morphological and opto-electrical properties of as grown film were analyzed. Optimized monocrystalline ultra-thin WS2 films of enhance crystallite (690 nm thick) were successfully hoarded with RF power of 150 W under 100°C temperature. © 2019 IEEE.
dc.language.isoenen_US
dc.titleInvestigating the Impact of Deposition Power on PVD Growth WS2 for Solar Cell Applicationen_US
dc.typeConference Paperen_US
dc.identifier.doi10.1109/IconSpace.2019.8905971-
item.grantfulltextopen-
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