Please use this identifier to cite or link to this item: http://dspace.uniten.edu.my/jspui/handle/123456789/5753
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dc.contributor.authorChakrabarty, C.K.en_US
dc.date.accessioned2017-12-08T06:45:52Z-
dc.date.available2017-12-08T06:45:52Z-
dc.date.issued2003-
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-0038617761&origin=resultslist&sort=plf-f&src=s&sid=364f2f835a259e592ab2300f3c887254&sot-
dc.description.abstractThe corrosion properties of nitrided stainless steel substrates processed in the H mode (plasma driven by an induced azimuthal electric field) of a low frequency rf inductively coupled plasma (ICP) source are investigated. The processing parameters were carefully selected considering the repeatability of the device. Nitrogen plasma operating in the H mode was used for the nitriding process and proper substrate bias was applied during nitriding. Several stainless steel substrates were nitrided at different processing times. Microhardness, XRD and EDX tests were performed on the nitrided samples prior to corrosion testing. The electrochemical polarisation method was used for the latter and the corrosion resistance properties were successfully characterised. Results show the correlation of nitriding times, the phases formed and surface hardness in an assessment of the corrosion properties of the samples.en_US
dc.language.isoen_USen_US
dc.relation.ispartofSurface Engineering Volume 19, Issue 1, February 2003, Pages 23-31en_US
dc.titleCorrosion properties of H mode RF inductively coupled plasma nitrided stainless steel substratesen_US
dc.typeArticleen_US
item.grantfulltextnone-
item.fulltextNo Fulltext-
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