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Please use this identifier to cite or link to this item: http://dspace.uniten.edu.my/jspui/handle/123456789/7845
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dc.contributor.authorCave, H.M.
dc.contributor.authorLim, C.-W.
dc.contributor.authorJermy, M.C.
dc.contributor.authorWu, J.-S.
dc.contributor.authorSmith, M.R.
dc.contributor.authorKrumdieck, S.P.
dc.date.accessioned2018-01-16T10:05:09Z-
dc.date.available2018-01-16T10:05:09Z-
dc.date.issued2009
dc.identifier.urihttp://dspace.uniten.edu.my/jspui/handle/123456789/7845-
dc.description.abstractIn this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet development in a Pulsed Pressure Chemical Vapour Deposition (PP-CVD) reactor. QDS is a novel method of gas flow simulation which is able to compute true-direction fluxes of mass, momentum and energy in a computationally efficient and accurate manner. The scheme is ideal for the simulation of novel CVD processes like PP-CVD which include highly unsteady flow structures and which has previously proved extremely difficult to simulate. Here, the axisymmetric QDS solver is outlined and the injection phase of a PP-CVD reactor is simulated. © The Electrochemical Society.
dc.titleCVD flow field modeling using the Quiet Direct Simulation (QDS) method
item.grantfulltextnone-
item.fulltextNo Fulltext-
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